DocumentCode
2016216
Title
Ti(Ta)O/sub 2/ film fabricated by magnetron sputtering and plasma immersion ion implantation and deposition: comparative study
Author
Chen, J.Y. ; Leng, Y.X. ; Yang, Ping ; Wan, G.J. ; Sun, Hongbin ; Wang, Jiacheng ; Huang, Nicole
Author_Institution
Sch. of Mater. Sci. & Eng., Southwest Jiaotong Univ., Chengdu, China
fYear
2003
fDate
5-5 June 2003
Firstpage
278
Abstract
Summary form only given, as follows. High performance hemocompatible materials have become the subject of increasing research in recent years. Specific kinds of surface modification are being developed as increasingly effective methods for improving the multi-functionality of devices, while obviating the need for high cost and long development times. As an effective method, plasma-based deposition of thin film materials has been applied to modify existing metallic biomaterials such as stainless steel, cobalt alloy and titanium, which have been applied as substrate materials for stents and mechanical heart valves, etc. The work described focuses on the comparison of the characteristics and properties of a new doped titanium dioxide film deposited using two different plasma-based deposition methods.
Keywords
biomedical materials; plasma immersion ion implantation; sputtered coatings; tantalum; titanium compounds; Ti(Ta)O/sub 2/ film; TiO/sub 2/:Ta; cobalt alloy; hemocompatible materials; magnetron sputtering; metallic biomaterials; plasma immersion ion implantation; plasma-based deposition methods; stainless steel; thin film materials; titanium; Biological materials; Building materials; Costs; Inorganic materials; Plasma devices; Plasma materials processing; Plasma properties; Sputtering; Steel; Titanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228823
Filename
1228823
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