Title :
Shadow effects in mesh-assisted plasma immersion ion implantation of insulating materials
Author :
Tian, X.B. ; Fu, R.K.Y. ; Yang, S.Q. ; Chu, Paul K.
Author_Institution :
Harbin Inst. of Technol., China
Abstract :
Summary form only given, as follows. In order to effectively conduct PIII of insulating materials, a metal mesh covering the insulating samples can be used . The high voltage is applied to the conducting mesh and ions are implanted into the insulating specimens via the grid holes.
Keywords :
plasma immersion ion implantation; grid holes; insulating materials; mesh-assisted plasma immersion ion implantation; metal mesh cover; shadow effects; Biological materials; Biomedical materials; Chemical elements; Conducting materials; Insulation; Materials science and technology; Plasma immersion ion implantation; Plasma properties; Plasma sources; Semiconductor materials;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228826
