• DocumentCode
    2016276
  • Title

    Shadow effects in mesh-assisted plasma immersion ion implantation of insulating materials

  • Author

    Tian, X.B. ; Fu, R.K.Y. ; Yang, S.Q. ; Chu, Paul K.

  • Author_Institution
    Harbin Inst. of Technol., China
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    279
  • Abstract
    Summary form only given, as follows. In order to effectively conduct PIII of insulating materials, a metal mesh covering the insulating samples can be used . The high voltage is applied to the conducting mesh and ions are implanted into the insulating specimens via the grid holes.
  • Keywords
    plasma immersion ion implantation; grid holes; insulating materials; mesh-assisted plasma immersion ion implantation; metal mesh cover; shadow effects; Biological materials; Biomedical materials; Chemical elements; Conducting materials; Insulation; Materials science and technology; Plasma immersion ion implantation; Plasma properties; Plasma sources; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1228826
  • Filename
    1228826
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2016276