DocumentCode :
2016390
Title :
Design of an InP-based deeply etched waveguide grating for the implementation of entire C- or L-band rejection filters
Author :
Davanço, Marcelo ; Blumenthal, Daniel J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, CA, USA
Volume :
1
fYear :
2004
fDate :
7-11 Nov. 2004
Firstpage :
300
Abstract :
In this paper, design and study of a deeply-etched grating that provides a reflection transfer function suited for implementation of an entire C- or L-optical communications band rejection filter, is presented, for applications in InP-based integrated optics.
Keywords :
III-V semiconductors; diffraction gratings; etching; indium compounds; integrated optics; optical communication equipment; optical design techniques; optical filters; optical waveguides; C-band rejection filters; InP; InP-based integrated optics; L-band rejection filters; deeply etched waveguide grating design; reflection transfer function; Band pass filters; Bandwidth; Computer displays; Gratings; Integrated optics; Optical design; Optical filters; Optical reflection; Photonic band gap; Transfer functions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
Type :
conf
DOI :
10.1109/LEOS.2004.1363230
Filename :
1363230
Link To Document :
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