DocumentCode :
2016587
Title :
High-speed ethylene-oxide plasma sterilization system without toxic residuals
Author :
Matsumoto, Kaname ; Kanitani, M.
Author_Institution :
Fac. of Informatics, Toyama Prefectural Univ., Japan
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
285
Abstract :
Summary form only given, as follows. We have developed a high-speed ethylene-oxide gas sterilizer without toxic residuals by using a poly-phase AC discharge plasma. The amount of gas use is 1/50 or less compared with the conventional ethylene-oxide gas sterilization system. Moreover, the whole sterilization-time is 1/20 or less, including the post-processing time to decompose toxic residuals.
Keywords :
organic compounds; plasma applications; AC discharge plasma; ethylene-oxide; plasma sterilization system; toxic residuals; Air pollution; Aluminum; Electrodes; Electron beams; Gases; Plasma chemistry; Plasma temperature; Surface contamination; Surface discharges; Thermal pollution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1228837
Filename :
1228837
Link To Document :
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