• DocumentCode
    2016946
  • Title

    Graded SiGe-Channel Modulation-Doped p-Mosfets

  • Author

    Verdonckt-Vandebroek, S. ; Crabbe, E.F. ; Meyerson, B.S. ; Harame, D.L. ; Restle, P.J. ; Stork, J.M.C. ; Megdanis, A.C. ; Stanis, C.L. ; Bright, A.A. ; Kroesen, G.M.W. ; Warren, A.C.

  • Author_Institution
    IBM Research Division, New York
  • fYear
    1991
  • fDate
    28-30 May 1991
  • Firstpage
    105
  • Lastpage
    106
  • Keywords
    Boron; Capacitance; Degradation; Epitaxial layers; Fabrication; Germanium silicon alloys; Insulation; MOSFET circuits; Silicon germanium; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
  • Conference_Location
    Oiso, Japan
  • Type

    conf

  • DOI
    10.1109/VLSIT.1991.706012
  • Filename
    706012