Title :
Use of Nanoprobing as the Diagnostic Tool for Nanoscaled Devices
Author :
Toh, S.L. ; Mai, Z.H. ; Tan, P.K. ; Hendarto, Erwin ; Tan, Hong ; Wang, Q.F. ; Cai, J.L. ; Deng, Qingzhong ; Ng, T.H. ; Goh, Y.W. ; Lam, James ; Hsia, L.C.
Author_Institution :
Chartered Semiconductor Mfg. Ltd., Singapore
Abstract :
Nanoprobing plays a crucial role for failure analysis (FA) in the nanometer-region generation nodes by having the capability to detect the failure sites and characterize the electrical behaviour of malfunctional devices for better understanding of the failure mechanisms. It also offers a guide to the necessary physical analysis in identifying the cause of failure. This established electrical failure analysis (EFA) methodology at a localized area helps to accelerate the FA. Its application to few of the front-end issues is highlighted in the paper.
Keywords :
failure analysis; nanoelectronics; diagnostic tool; failure analysis; nanoprobing; nanoscaled devices; Atomic force microscopy; Character generation; Circuit faults; Failure analysis; Fault diagnosis; Nanoscale devices; Probes; Random access memory; Scanning electron microscopy; Wood industry;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2007. IPFA 2007. 14th International Symposium on the
Conference_Location :
Bangalore
Print_ISBN :
978-1-4244-1014-9
DOI :
10.1109/IPFA.2007.4378057