DocumentCode :
2017131
Title :
Large fabrication tolerance of ultrabroadband sub-wavelength grating reflector
Author :
Huang, Michael C Y ; Lee, Karen K Y ; Parekh, Devang ; Chang-Hasnain, Connie J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume :
1
fYear :
2004
fDate :
7-11 Nov. 2004
Firstpage :
364
Abstract :
The fabrication tolerance of the highly reflective sub-wavelength grating (SWG) structure is examined, particularly the effect of reflectivity from etching imperfections, with calculations using rigorous coupled wave analysis method.
Keywords :
coupled mode analysis; diffraction gratings; mirrors; optical fabrication; reflectivity; etching imperfections; fabrication tolerance; reflectivity; rigorous coupled wave analysis; subwavelength grating; Bandwidth; Distributed Bragg reflectors; Etching; Fabrication; Gratings; Mirrors; Optical polarization; Optical reflection; Reflectivity; Reluctance generators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
Type :
conf
DOI :
10.1109/LEOS.2004.1363262
Filename :
1363262
Link To Document :
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