DocumentCode
2017313
Title
The black silicon method. IV. The fabrication of three-dimensional structures in silicon with high apect ratios for scanning probe microscopy and other applications
Author
Jansen, Henri ; De Boer, Meint ; Otter, Bert ; Elwenspoek, Miko
fYear
1995
fDate
29 Jan-2 Feb 1995
Firstpage
88
Keywords
Anisotropic magnetoresistance; Dry etching; Fabrication; Micromechanical devices; Plasma applications; Plasma chemistry; Scanning probe microscopy; Silicon; Sulfur hexafluoride; Surface texture;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE
Print_ISBN
0-7803-2503-6
Type
conf
DOI
10.1109/MEMSYS.1995.472548
Filename
472548
Link To Document