DocumentCode :
2017313
Title :
The black silicon method. IV. The fabrication of three-dimensional structures in silicon with high apect ratios for scanning probe microscopy and other applications
Author :
Jansen, Henri ; De Boer, Meint ; Otter, Bert ; Elwenspoek, Miko
fYear :
1995
fDate :
29 Jan-2 Feb 1995
Firstpage :
88
Keywords :
Anisotropic magnetoresistance; Dry etching; Fabrication; Micromechanical devices; Plasma applications; Plasma chemistry; Scanning probe microscopy; Silicon; Sulfur hexafluoride; Surface texture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE
Print_ISBN :
0-7803-2503-6
Type :
conf
DOI :
10.1109/MEMSYS.1995.472548
Filename :
472548
Link To Document :
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