Title :
PSpice/spl reg/ simulation of one atmosphere uniform glow discharge plasma (OAUGDP/spl trade/) reactor systems
Author :
Zhiyu Chen ; Roth
Author_Institution :
Dept. of Electr. & Comput. Eng., Tennessee Univ., Knoxville, TN, USA
Abstract :
Summary form only given, as follows. The PSpice software has been used to simulate the electrical characteristics of a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP/sup TM/) reactor system. An OAUGDP/sup TM/ reactor system normally includes a power supply, a transformer, an impedance matching network, and the plasma reactor. We have developed a PSpice model for the plasma discharge in a OAUGDP/sup TM/ reactor, which may consist either of two parallel electrode plates with a small gap between them, or a planar plasma layer generated by coplanar parallel electrode strips. In an OAUGDP/sup TM/, at least one electrode is covered with a dielectric, which can be modeled as a capacitor, as can the gap containing the plasma. The plasma discharge itself is modeled as a voltage-controlled current source that is switched on when the voltage across the gap exceeds the plasma initiation voltage. The current source and its output current follow a power law of the voltage, an observed phenomenological characteristic of the voltage-current behavior of normal glow discharges. Simulation results agree well with experimental data from actual reactors It has been found that in different operating regimes, the discharge current of the OAUGDP/sup TM/ is described by voltage power laws with different exponents, and that the capacitance of the impedance matching network affects the shape of the modeled discharge current waveform in a manner consistent with experiment.
Keywords :
glow discharges; OAUGDP; One Atmosphere Uniform Glow Discharge Plasma; PSpice software; capacitance; discharge current waveform; impedance matching network; parallel electrode plates; phenomenological characteristic; Atmosphere; Atmospheric modeling; Electrodes; Glow discharges; Impedance matching; Inductors; Plasma properties; Plasma simulation; Plasma sources; Voltage;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228865