Optimization of the processing parameters for pulsed laser deposition of ZnO thin films

Summary form only given, as follows. Pulsed laser deposition (PLD) is a rapid, efficient and versatile technique for fabrication of thin films with an atomistic control of the composition. Recently, much effort has been paid to employ PLD for the growth of wide band-gap semiconductor films and heterostuctures The present work describes the pulsed laser deposition of ZnO thin films. The effects of background oxygen pressure on the structural and optical properties of ZnO films have been investigated systemically. It is found that the velocity distribution of droplet and particulate in the plasma plume changes with increasing background oxygen pressure, and at the same time, the dominant growth mechanism of thin films changes. The effects of substrate temperature and pulse repetition rate on the properties of ZnO are discussed. The optimal processing parameters for this study have been found.