Title :
Effect of heat treatment on performance characteristics of operational amplifier
Author :
Perov, Gennady V. ; Shevalye, Marina A.
Author_Institution :
Siberian State Univ. of Telecommun. & Inf., Novosibirsk, Russia
fDate :
June 30 2010-July 4 2010
Abstract :
The abilities of operational amplifier parameters stabilization by wafer low-temperature annealing at 350-400°C in oxygen atmosphere before laser trimming of preset resistors of op amp have been considered.
Keywords :
annealing; laser beam applications; operational amplifiers; resistors; heat treatment effect; laser trimming; operational amplifier parameter stabilization; oxygen atmosphere; preset resistors; temperature 350 degC to 400 degC; wafer low-temperature annealing; Annealing; Artificial neural networks; Heating; Informatics; Seminars; Operational amplifier; laser trimming of op amp resistor on performance characteristics; resistive layer;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-6626-9
DOI :
10.1109/EDM.2010.5568832
