Radial profiles of oxygen atoms in an inductively coupled oxygen RF discharges

Summary form only given, as follows. The uniformity of dissociated neutrals on the wafer has been an important issue in the plasma processing utilizing a high-density large area plasma reactor. In this study, inductively coupled oxygen RF discharges which have widespread applications in plasma processing are considered. Radial profiles of atomic oxygen are estimated by an one-dimensional discharge model, and also measured by spatially resolved actinometry. Essential issues associated with electronegative plasmas such as oxygen discharge are the mechanism of the negative ion generation and destruction, the influence of negative ions on the transport of charged species, the structure of sheath, and chemical reactions between neutrals and negative ions. The one-dimensional discharge model consists of a three-fluid equilibrium discharge model and a diffusion equation of atomic oxygen. The three fluid model includes one positive ion species, one negative ion species, and Maxwellian electrons In a spatially resolved actinometry, the intensity of optical emission from electronically excited oxygen atoms (844 nm emission) normalized to the intensity of the 750 nm emission from argon atoms added in small quantity is assumed to be a measure of the relative concentration of ground-state oxygen atoms in the plasma. The effects if rf input power, substrate bias power, and gas pressure on the uniformity of atomic oxygen are investigated.