Title :
Comparison of electron density measurements by using a plasma absorption probe and a double Langmuir probe in inductively coupled plasmas
Author :
Jung-Hyung Kim ; Sang-Chul Choi ; Yong-Hyun Shin ; Kwang-Hwa Chung
Author_Institution :
Center for Vacuum Technol., Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
Abstract :
Summary form only given, as follows. The absolute, spatially resolved electron densities in inductively coupled plasmas have been measured by using two different plasma diagnostic tools, a plasma absorption probe and double Langmuir probe. The plasma absorption probe is able to measure the absolute, spatially resolved electron density even when the probe is soiled with processing plasmas. The technique is based on the resonant absorption of surface waves excited in a cavity at the probe head. The plasma absorption probe consists of a small antenna connected with a coaxial cable. The antenna is enclosed in a tube inserted in a plasma. The plasma source is a planar inductively coupled plasma. Over a wide parameter range (gas type, input power and gas pressure), the results by the two techniques are compared and analyzed.
Keywords :
Langmuir probes; plasma density; plasma probes; plasma sources; coaxial cable; double Langmuir probe; inductively coupled plasmas; plasma absorption probe; plasma diagnostic tools; resonant absorption; small antenna; spatially resolved electron densities; surface waves; Absorption; Density measurement; Electrons; Plasma density; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma sources; Plasma waves; Probes;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228951