On electron heating mechanism in low pressure high density inductively coupled plasma (ICP)

Summary form only given, as follows. The electron heating mechanism in a low-pressure inductively coupled plasma (ICP) is investigated. Two types of resonant coupling between electrons and radio frequency electric fields are possible in low pressure ICP. The electron bounce resonance corresponding to the first resonant coupling is a dominant electron heating mechanism in a finite size ICP. We find out that the electron bounce resonance has a dependence on electron density when we calculate energy diffusion coefficients against electron density. This dependence on the electron density seems to be related to electron motion in the skin layer. The change in the electron bounce resonance is analyzed and discussed in this paper.