DocumentCode :
2019800
Title :
Two-photon 3D lithography: materials and applications
Author :
Kuebler, Stephen M. ; Braun, Kevin L. ; Stellacci, Francesco ; Bauer, Christina A. ; Halik, Marcus ; Zhou, Wenhui ; Yu, Tianyue ; Ober, Christopher K. ; Marder, Seth R. ; Perry, Joseph W.
Author_Institution :
Dept. of Chem., Arizona Univ., Ithaca, NY, USA
Volume :
2
fYear :
2004
fDate :
7-11 Nov. 2004
Firstpage :
561
Abstract :
This study demonstrates the fabrication of a representative set of microstructures based on the three classes of two-photon photoactive materials compositions. Such structures can be used directly for suitable applications but can also be used as templates for the growth or molding of other materials as needed for a specific application. Given the ability of the two-photon lithography to produce 3D patterns of arbitrary structure, there is potential for the fabrication of an essentially limitless number of micro- and nano-structures in a wide variety of materials compositions.
Keywords :
micro-optics; moulding; nanolithography; nanopatterning; optical fabrication; optical materials; photolithography; two-photon processes; 3D lithography; 3D patterns; growth templates; material compositions; microstructure fabrication; molding; nanostructure fabrication; two-photon lithography; two-photon photoactive materials; Absorption; Chemistry; Lithography; Materials science and technology; Microstructure; Optical device fabrication; Photochemistry; Polymers; Power generation; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
Type :
conf
DOI :
10.1109/LEOS.2004.1363362
Filename :
1363362
Link To Document :
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