Title :
Measurement of plasma density and electron temperature based on the bi-Maxwellian EEDF and non-LTE model in a low pressure spraying plasma
Author :
Yong Ho Jung ; Kyu-Sun Chung
Author_Institution :
Dept. of Nucl. Eng., Hanyang Univ., Seoul, South Korea
Abstract :
Summary form only given, as follows. The non-Maxwellian distribution is possible for the case of low-pressure spraying plasma and edge plasma of atmospheric spraying plasma. In this work, the non-Maxwellian distribution of electrons was measured by using an electric probe installed on the fast scanning probe system, and non-LTE effects were measured by using the optical emission spectroscopy system. Distribution of the electrons of a low-pressure spraying plasma is observed not as Maxwellian but as bi-Maxwellian by the measurement of the single probe. Non-LTE characteristics of a low-pressure spraying plasma, can be deduced from the measured results of the optical emission spectroscopy and is analyzed by the collisional radiative equilibrium (CRE) model, where the Maxwellian and the non-Maxwellian distributions are assumed for comparison. For the electron temperature, the results from optical emission spectroscopy were similar to the results from the single probe (3/spl sim/5% in error).
Keywords :
atomic emission spectroscopy; plasma arc spraying; plasma collision processes; plasma density; plasma diagnostics; plasma temperature; bi-Maxwellian distributions; collisional radiative equilibrium model; electric probe; electron temperature; fast scanning probe system; low pressure spraying plasma; non-LTE effects; nonMaxwellian distribution; optical emission spectroscopy; plasma density; Atmospheric measurements; Density measurement; Electron optics; Plasma density; Plasma measurements; Plasma temperature; Pressure measurement; Probes; Stimulated emission; Thermal spraying;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228976