Title :
A 5 GHz CMOS Tunable Image-Rejection Low-Noise Amplifier
Author :
Lee, Ler Chun ; Abu Khari Bin A´ain ; Kordesch, Albert Victor
Author_Institution :
Fac. of Electr. Eng., Univ. of Technol. Malaysia, Johor
Abstract :
A 5 GHz image-rejection low-noise amplifier (IR-LNA) was designed using Silterra´s CMOS 0.18 mum RF process. The IR-LNA employs a tunable third-order notch filter to reject the image signal. The notch filter was designed using a metal-insulator-metal capacitor (MIM) and a high quality factor (Q) active resonator. The notch frequency of the filter can be tuned using active inductor. The IR-LNA was simulated using HSPICE with BSIM3v3 MOSFET models. Simulation results show that the IR-LNA exhibits S11 of -22.67 dB, S21 of 16.45 dB, S12 of -75.84 dB, 2.66 dB noise figure (NF), and -21.8 dBm input compression point (P1dB) at 5 GHz. The power dissipation of the IR-LNA is 15.46 mW. With an intermediate frequency of 550 MHz, the image-rejection of the notch filter is -16dB. The tuning range of the notch filter is from 3.30 GHz to 4.15 GHz with a maximum -36 dB image rejection
Keywords :
CMOS analogue integrated circuits; MIM devices; MOSFET; Q-factor; SPICE; low noise amplifiers; microwave amplifiers; microwave integrated circuits; notch filters; resonators; semiconductor device models; -22.67 dB; -75.84 dB; 0.18 micron; 15.46 mW; 16.45 dB; 2.66 dB; 3.30 to 4.15 GHz; 5 GHz; 550 MHz; BSIM3v3 MOSFET models; CMOS tunable image-rejection low-noise amplifier; HSPICE; Silterra´s CMOS RF process; active inductor; high quality factor active resonator; metal-insulator-metal capacitor; notch frequency; tunable third-order notch filter; Active inductors; CMOS process; Low-noise amplifiers; MIM capacitors; MOSFET circuits; Noise figure; Q factor; Radio frequency; Resonant frequency; Resonator filters; Active inductor; Image-rejection; Low-noise amplifier;
Conference_Titel :
RF and Microwave Conference, 2006. RFM 2006. International
Conference_Location :
Putra Jaya
Print_ISBN :
0-7803-9745-2
Electronic_ISBN :
0-7803-9745-2
DOI :
10.1109/RFM.2006.331058