Title :
Low-loss micro-machined four-pole linear phase filter in silicon technology
Author :
Gautier, William ; Stehle, Armin ; Schoenlinner, Bernhard ; Ziegler, Volker ; Prechtel, Ulrich ; Menzel, Wolfgang
Author_Institution :
Defence Electron., EADS Deutschland GmbH, Ulm, Germany
fDate :
Sept. 29 2009-Oct. 1 2009
Abstract :
In this paper, a micro-machined linear phase filter for K-band satellite communication is presented. The filter is a four-pole cavity resonator band-pass filter. It is fabricated in silicon using the KOH-wet etching technique, and the filter is assembled by bonding two silicon wafers. The proposed configuration enables the realisation of low-loss and low-cost filters, which are easily integrable, monolithically or in a hybrid fashion, in microwave front-ends. Further, as it is described in the paper, the arrangement proposed for the cavity resonators allows for the realisation of cross-couplings between the cavity resonators, and it makes possible the design of compact linear phase filters. This paper presents the design and the measurement of a single micro-machined cavity resonator, and it describes the design procedure of the four-pole filter. This design of the complete four-pole micro-machined linear phase filter is finally assessed by full-wave simulation.
Keywords :
band-pass filters; cavity resonators; etching; linear phase filters; micromachining; satellite communication; KOH; compact linear phase filter; cross-couplings; four-pole cavity resonator band-pass filter; full-wave simulation; low-cost filter; low-loss filter; low-loss micromachined four-pole linear phase filter; satellite communication; silicon technology; silicon wafer; single micromachined cavity resonator; wet etching; Assembly; Band pass filters; Cavity resonators; Etching; K-band; Microwave filters; Nonlinear filters; Resonator filters; Satellite communication; Silicon;
Conference_Titel :
Microwave Conference, 2009. EuMC 2009. European
Conference_Location :
Rome
Print_ISBN :
978-1-4244-4748-0