• DocumentCode
    2021369
  • Title

    Three-dimensional nonequilibrium numerical modeling of arc-anode attachment in high-intensity argon arcs

  • Author

    Park, Jongho ; Heberlein, J. ; Pfender ; Candler, G.

  • Author_Institution
    Minnesota Univ., Minneapolis, MN, USA
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    386
  • Abstract
    Summary form only given, as follows. A three-dimensional numerical model has been developed to understand arc-anode attachment phenomena observed in direct-current electric arcs. The developed model fully couples a plasma flow with associated electromagnetic fields in a self-consistent manner. The electrons are assumed to have a separate Maxwellian distribution from the heavy particle one, based on the two-temperature model The species continuities are taken into account to consider chemical non-equilibrium. The species diffusion fluxes are calculated using the Self-Consistent Effective Binary Diffusion approximation. The electric and magnetic potential equations are coupled to obtain electric and magnetic fields with a well-defined current density, based on the species diffusion flux formulation. The governing equations are solved using the Finite Volume Method (FVM). The Gauss-Seidel Line Relaxation (GSLR) method is used to find out solutions of the linearized equations, using successive sweeps in two different directions in a three-dimensional domain. The model is applied to a high-intensity argon arc with the plasma flow along the arc axis directed towards the anode surface. An additional cold cross flow is imposed with varying velocities parallel to the anode surface and perpendicular to the plasma flow. The results show the arc attachment deflection and stability for the different conditions.
  • Keywords
    arcs (electric); argon; current density; finite volume methods; iterative methods; plasma flow; plasma simulation; plasma transport processes; Ar; Gauss-Seidel line relaxation method; Maxwellian distribution; arc attachment deflection; arc attachment stability; arc-anode attachment; cold cross flow; current density; direct-current electric arcs; electric potential equations; electromagnetic fields; finite volume method; high-intensity argon arcs; magnetic potential equations; nonequilibrium numerical model; plasma flow; self-consistent effective binary diffusion approximation; species continuities; species diffusion flux formulation; three-dimensional numerical model; Anodes; Argon; Electromagnetic coupling; Electromagnetic fields; Electromagnetic modeling; Electrons; Equations; Numerical models; Plasma chemistry; Plasma stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1229027
  • Filename
    1229027