DocumentCode :
2021575
Title :
Multi keV x-ray source from femtosecond laser produced micro plasma
Author :
Serbanescu, C. ; Santiago, Juanito ; Fedosejevs, Robert
Author_Institution :
Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
390
Abstract :
Summary form only given, as follows. In the experiments reported, laser-produced plasma keV x-rays have been generated by 120fs, 800nm, 0.5mJ Ti sapphire laser pulses. The experiments have concentrated not only on the characterization but also the comparison of the keV x-ray emission generated in both air and vacuum. Scaling of x-ray conversion efficiency, dependence on pulse energy, pulse duration and angle of incidence have been investigated. Size of the resultant emission spot and brightness of the source are also under study. Enhancement of the keV x-ray production through the presence of a laser prepulse shows that the interactions in the underdense plasma may also contribute to hot electron and keV x-ray generation.
Keywords :
plasma X-ray sources; plasma production by laser; 0.5 mJ; 120 fs; 800 nm; femtosecond laser produced microplasma; hot electrons; laser prepulse; multi keV X-ray source; pulse duration; pulse energy; underdense plasma; x-ray conversion efficiency; x-ray emission; Acceleration; Electrons; Light scattering; Optical pulses; Particle scattering; Plasma accelerators; Plasma sources; Plasma x-ray sources; X-ray lasers; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1229035
Filename :
1229035
Link To Document :
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