Title :
Effect of magnetic field on high-voltage glow discharge during plasma implantation
Author :
Tian, X.B. ; Yang, S.Q. ; Fu, R.K.Y. ; Chu, P.K.
Author_Institution :
Harbin Inst. of Technol., China
Abstract :
Summary form only given, as follows. In this paper, we report our findings on the effects on the magnetic field on the high-voltage glow discharge process.
Keywords :
glow discharges; high-voltage techniques; plasma immersion ion implantation; plasma magnetohydrodynamics; high-voltage glow discharge; magnetic field; plasma implantation; Cities and towns; Costs; Electrons; Glow discharges; Magnetic fields; Nuclear and plasma sciences; Physics; Plasma immersion ion implantation; Radio frequency; Surface discharges;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229047
