DocumentCode
2021856
Title
Effect of magnetic field on high-voltage glow discharge during plasma implantation
Author
Tian, X.B. ; Yang, S.Q. ; Fu, R.K.Y. ; Chu, P.K.
Author_Institution
Harbin Inst. of Technol., China
fYear
2003
fDate
5-5 June 2003
Firstpage
397
Abstract
Summary form only given, as follows. In this paper, we report our findings on the effects on the magnetic field on the high-voltage glow discharge process.
Keywords
glow discharges; high-voltage techniques; plasma immersion ion implantation; plasma magnetohydrodynamics; high-voltage glow discharge; magnetic field; plasma implantation; Cities and towns; Costs; Electrons; Glow discharges; Magnetic fields; Nuclear and plasma sciences; Physics; Plasma immersion ion implantation; Radio frequency; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229047
Filename
1229047
Link To Document