Title :
Influence of increasing deposition temperature on opto-electrical properties of amorphous carbon thin film
Author :
Hussin, Hanim ; Zakaria, Muhammad Bazli ; Mohamad, Fakardellawarni ; Rusop, Mohamad ; Muhamad, Maizan
Author_Institution :
Fac. of Electr. Eng., Univ. Teknol. MARA, Shah Alam, Malaysia
Abstract :
Amorphous carbon (a-C) thin films were deposited on silicon (Si) substrate by pyrolysing camphor oil at various temperatures with thermal chemical vapor deposition (CVD) technique. The deposited a-C thin films were characterized by Current-Voltage (I-V) Measurement and UV-VIS-NIR Spectrophotometer. The electrical and optical properties of these films have been studied. It was found that increasing deposition temperature had influence on the a-C thin films properties. In addition the carrier gas flow showed a secondary impact on the properties of a-C thin films. The resistivity of a-C thin films decreases when the deposition temperature increases. However, at higher deposition temperature the conductivity increases due to the formation of more disorder sp2 carbon site.
Keywords :
amorphous semiconductors; carbon; chemical vapour deposition; electric properties; elemental semiconductors; optical properties; pyrolysis; semiconductor thin films; silicon; substrates; ultraviolet spectra; visible spectra; C; Si; UV-VIS-NIR spectrophotometer; amorphous carbon thin film; camphor oil pyrolysis; carrier gas flow; current-voltage measurement; increasing deposition temperature; optical properties; opto-electrical properties; silicon substrate; thermal chemical vapor deposition; Amorphous materials; Chemical vapor deposition; Conductivity; Optical films; Petroleum; Semiconductor thin films; Silicon; Sputtering; Substrates; Temperature; Amorphous carbon; camphor oil; thermal CVD; thin films;
Conference_Titel :
Research and Development (SCOReD), 2009 IEEE Student Conference on
Conference_Location :
UPM Serdang
Print_ISBN :
978-1-4244-5186-9
Electronic_ISBN :
978-1-4244-5187-6
DOI :
10.1109/SCORED.2009.5443025
