DocumentCode
2022507
Title
The development of 3D aerospace SRAM integration technology using silicon interposer
Author
He, Xin ; Shan, Guang-Bao ; Wu, Long-Sheng ; Sun, You-min ; Du, Xin-Rong
Author_Institution
Xian microelectronics technology research institute, No.26 Xin Xi Avenue, Shanxi 710119, China
fYear
2015
fDate
11-14 Aug. 2015
Firstpage
994
Lastpage
996
Abstract
The new 3D SRAM integration technology using silicon interposer is proposed. To build this 3D SRAM integration, the design of 3D SRAM architecture is studied. And the electrical simulation of this design scheme is carried out. The maximum crosstalk noise is less than 10% of the power supply voltage. The access speed of 3D SRAM is increased from 37.7ns (sole circuit) to 41.6ns; Under the condition of high temperature and low pressure SS CASE, the output high-voltage is 2.42V, and output low-voltage is 0.56V. 3D SRAM sample is developed successfully using through-silicon via (TSV) technology. This verification sample consists of four conventional SRAM, then the four conventional SRAM are bonded on silicon interposer with chip-to-chip bonding. The shear stress of bumps on the SRAM is 21gf. The new 3D SRAM capacity increase four times than sole SRAM without changing the key design of SRAM.
Keywords
Manufacturing; Random access memory; Three-dimensional displays; 3D IC; 3D SRAM; TSV; silicon interposer;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology (ICEPT), 2015 16th International Conference on
Conference_Location
Changsha, China
Type
conf
DOI
10.1109/ICEPT.2015.7236746
Filename
7236746
Link To Document