Title :
Reflectivity of SiC/Mg multilayer at wavelengths around 30 nm
Author :
Takenaka, Hisataka
Author_Institution :
NTT Adv. Technol. Co., Ibaraki, Japan
Abstract :
Reflectivity measurements were performed on SiC/Mg multilayers fabricated by magnetron sputtering. Transmission electron microscopy (TEM) observations of the structure of an as-deposited multilayer revealed the Mg layers to be polycrystalline and the SiC layers to be amorphous. It was found that these multilayers exhibit a high reflectivity of over 40% at normal incidence making it a good mirror for a wavelength of around 30 nm. It was also observed that the reflectivity remains constant up to a temperature of 300 °C in an Ar atmosphere.
Keywords :
amorphous semiconductors; magnesium; optical fabrication; optical multilayers; reflectivity; silicon compounds; sputter deposition; transmission electron microscopy; wide band gap semiconductors; Ar; SiC-Mg; TEM; amorphous; magnetron sputtering; mirror; multilayers; polycrystalline; reflectivity; transmission electron microscopy; Amorphous magnetic materials; Amorphous materials; Magnetic multilayers; Nonhomogeneous media; Performance evaluation; Reflectivity; Silicon carbide; Sputtering; Transmission electron microscopy; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
DOI :
10.1109/LEOS.2004.1363493
