Title :
Interferometric lithography at 47 nm with a table-top laser
Author :
Capeluto, M.G. ; Vaschenko, G. ; Marconi, M.C. ; Grisham, M. ; Menoni, C.S. ; Rocca, J.J.
Author_Institution :
Dept. of Phys., Buenos Aires Univ., Argentina
Abstract :
We use interferometric lithography to demonstrate printing of dense lines as thin as 30 nm on polymethyl-metacrylate using the high average power output from of a λ = 46.9 nm compact high repetition rate EUV laser.
Keywords :
light interferometers; nanolithography; nanopatterning; polymers; ultraviolet lithography; 30 nm; 46.9 nm; EUV laser; interferometric lithography; polymethyl-metacrylate; Gratings; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Power engineering and energy; Resists; Surface emitting lasers; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
DOI :
10.1109/LEOS.2004.1363527
