• DocumentCode
    2023956
  • Title

    Numerical analysis and parameter optimization of thermal stress effect for low-k layer flip-chip with copper pillar bump

  • Author

    Yu, Huiping ; Feng, Feng ; Qin, Fei ; Wu, Wei ; An, Tong ; Chen, Pei

  • Author_Institution
    College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, China
  • fYear
    2015
  • fDate
    11-14 Aug. 2015
  • Firstpage
    1219
  • Lastpage
    1223
  • Abstract
    The thermal-mechanical reliability of the flip-chip with copper pillar bump is analyzed through finite element numerical simulation and Kriging response surface models optimization method. The results show that: the successive order of factors affecting the chip warpage is: die thickness, bump pitch, die thickness, substrate thickness, Cu Pillar height, Cu Pillar height, PI thickness, PI opening size; the successive order of factors affecting the stress is: PI opening size, bump pitch, PI thickness, die thickness, Cu Pillar height, substrate thickness; the objectives and constraints are explicated through Kriging model. In Kriging model, the quadratic form is adopted as regression function, Gaussian function is chosen as correlative function, and sequential quadratic programming is used to solve the problem. After optimization, the first principal stress is decreased significantly on the Low-K layer; meanwhile, chip warpage is under control.
  • Keywords
    Copper; Fitting; Flip-chip devices; Optimization; Response surface methodology; Stress; Substrates; copper pillar bump; finite element numerical simulation; reliability; response surface models optimization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology (ICEPT), 2015 16th International Conference on
  • Conference_Location
    Changsha, China
  • Type

    conf

  • DOI
    10.1109/ICEPT.2015.7236799
  • Filename
    7236799