DocumentCode
2024778
Title
Improvement of fabrication yield and loss uniformity of waveguide mirror
Author
Park, Jeong-Woo ; Song, Jung-Ho ; Sim, Eun-Deok ; Beak, Yong-Soon
Author_Institution
Opt. Commun. Devices Dept., Electron. & Telecommun. Res. Inst., Daejeon, South Korea
Volume
2
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
951
Abstract
Using a new design method, improvement of fabrication yield and uniformity were obtained for waveguide mirror for PIC and optical PCB. Analysis shows that the most significant source of loss is the bevel of facet.
Keywords
integrated optics; mirrors; optical design techniques; optical fabrication; optical losses; optical waveguide components; PIC; fabrication yield; facet bevel; loss uniformity; optical PCB; waveguide mirror; Etching; Mirrors; Optical device fabrication; Optical devices; Optical losses; Optical surface waves; Optical waveguides; Rough surfaces; Surface roughness; Turning;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN
0-7803-8557-8
Type
conf
DOI
10.1109/LEOS.2004.1363560
Filename
1363560
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