• DocumentCode
    2024839
  • Title

    CMOS compatible modulation of 1.5-micron light using silicon nanocrystals

  • Author

    Bickford, Justin ; Bambha, Neal ; Preble, Stefan

  • Author_Institution
    US Army Res. Lab., Adelphi, MD, USA
  • fYear
    2012
  • fDate
    11-13 Sept. 2012
  • Firstpage
    86
  • Lastpage
    87
  • Abstract
    We report Plasma Enhanced Chemical Vapor Deposition (PECVD) growth and optical characterization of Silicon nanocrystals on fuzed quartz, and present a low voltage ultrafast CMOS compatible modulator design utilizing the DC Kerr electro-optic effect.
  • Keywords
    CMOS integrated circuits; Kerr electro-optical effect; electro-optical modulation; elemental semiconductors; integrated optoelectronics; nanofabrication; nanophotonics; nanostructured materials; optical design techniques; plasma CVD; semiconductor growth; semiconductor thin films; silicon; 1.5-micron light; CMOS compatible modulation; DC Kerr electro-optic effect; PECVD growth; Si; SiO2; fuzed quartz; low voltage ultrafast CMOS compatible modulator design; optical characterization; plasma enhanced chemical vapor deposition; silicon nanocrystals; size 1.5 micron; Annealing; Indexes; Nanocrystals; Optical modulation; Silicon; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Avionics, Fiber- Optics and Photonics Technology Conference (AVFOP), 2012 IEEE
  • Conference_Location
    Cocoa Beach, FL
  • Print_ISBN
    978-1-4577-0757-5
  • Type

    conf

  • DOI
    10.1109/AVFOP.2012.6344035
  • Filename
    6344035
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2024839