• DocumentCode
    2025770
  • Title

    Electromechanical resonances of SiC and AlN beams under ambient conditions

  • Author

    Brueckner, K. ; Förster, Ch ; Tonisch, K. ; Cimalla, V. ; Ambacher, O. ; Stephan, R. ; Blau, K. ; Hein, M.A.

  • Author_Institution
    Dept. for RF & Microwave Tech., Technische Univ. Ilmenau, Germany
  • fYear
    2005
  • fDate
    3-4 Oct. 2005
  • Firstpage
    585
  • Lastpage
    588
  • Abstract
    MEMS resonators offer great potential for RF sensor and filter applications. A semiconductor process has been used to prepare SiC and AlN beam resonators. The metallised beams are excited by an RF current in a permanent magnetic field. The resonant response is detected by the induced voltage. Despite the weakness of the signal, accurate detection has been achieved in the time domain, under ambient conditions in a magnetic field of about 0.5 T. The resonant response bears valuable information on the structural quality of the material and identifies potential for further improvement. The time domain technique presents an elegant approach to sensing applications.
  • Keywords
    filters; micromechanical resonators; microsensors; silicon compounds; time-domain analysis; wide band gap semiconductors; MEMS resonators; RF sensor; electrochemical resonance; filter applications; metallised beams; permanent magnetic field; semiconductor process; time domain technique; Electromechanical sensors; Magnetic fields; Magnetic materials; Magnetic resonance; Magnetic sensors; Magnetic separation; Micromechanical devices; Radio frequency; Resonator filters; Silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide and Other Semiconductor Application Symposium, 2005. EGAAS 2005. European
  • Conference_Location
    Paris
  • Print_ISBN
    88-902012-0-7
  • Type

    conf

  • Filename
    1637286