DocumentCode
2025770
Title
Electromechanical resonances of SiC and AlN beams under ambient conditions
Author
Brueckner, K. ; Förster, Ch ; Tonisch, K. ; Cimalla, V. ; Ambacher, O. ; Stephan, R. ; Blau, K. ; Hein, M.A.
Author_Institution
Dept. for RF & Microwave Tech., Technische Univ. Ilmenau, Germany
fYear
2005
fDate
3-4 Oct. 2005
Firstpage
585
Lastpage
588
Abstract
MEMS resonators offer great potential for RF sensor and filter applications. A semiconductor process has been used to prepare SiC and AlN beam resonators. The metallised beams are excited by an RF current in a permanent magnetic field. The resonant response is detected by the induced voltage. Despite the weakness of the signal, accurate detection has been achieved in the time domain, under ambient conditions in a magnetic field of about 0.5 T. The resonant response bears valuable information on the structural quality of the material and identifies potential for further improvement. The time domain technique presents an elegant approach to sensing applications.
Keywords
filters; micromechanical resonators; microsensors; silicon compounds; time-domain analysis; wide band gap semiconductors; MEMS resonators; RF sensor; electrochemical resonance; filter applications; metallised beams; permanent magnetic field; semiconductor process; time domain technique; Electromechanical sensors; Magnetic fields; Magnetic materials; Magnetic resonance; Magnetic sensors; Magnetic separation; Micromechanical devices; Radio frequency; Resonator filters; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Gallium Arsenide and Other Semiconductor Application Symposium, 2005. EGAAS 2005. European
Conference_Location
Paris
Print_ISBN
88-902012-0-7
Type
conf
Filename
1637286
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