DocumentCode :
2025770
Title :
Electromechanical resonances of SiC and AlN beams under ambient conditions
Author :
Brueckner, K. ; Förster, Ch ; Tonisch, K. ; Cimalla, V. ; Ambacher, O. ; Stephan, R. ; Blau, K. ; Hein, M.A.
Author_Institution :
Dept. for RF & Microwave Tech., Technische Univ. Ilmenau, Germany
fYear :
2005
fDate :
3-4 Oct. 2005
Firstpage :
585
Lastpage :
588
Abstract :
MEMS resonators offer great potential for RF sensor and filter applications. A semiconductor process has been used to prepare SiC and AlN beam resonators. The metallised beams are excited by an RF current in a permanent magnetic field. The resonant response is detected by the induced voltage. Despite the weakness of the signal, accurate detection has been achieved in the time domain, under ambient conditions in a magnetic field of about 0.5 T. The resonant response bears valuable information on the structural quality of the material and identifies potential for further improvement. The time domain technique presents an elegant approach to sensing applications.
Keywords :
filters; micromechanical resonators; microsensors; silicon compounds; time-domain analysis; wide band gap semiconductors; MEMS resonators; RF sensor; electrochemical resonance; filter applications; metallised beams; permanent magnetic field; semiconductor process; time domain technique; Electromechanical sensors; Magnetic fields; Magnetic materials; Magnetic resonance; Magnetic sensors; Magnetic separation; Micromechanical devices; Radio frequency; Resonator filters; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide and Other Semiconductor Application Symposium, 2005. EGAAS 2005. European
Conference_Location :
Paris
Print_ISBN :
88-902012-0-7
Type :
conf
Filename :
1637286
Link To Document :
بازگشت