DocumentCode :
2027787
Title :
Characteristics of interface states in irradiated Pd/n-SiGe as derived from frequency- and temperature-dependent admittance
Author :
Sellai, A. ; Mamor, M.
Author_Institution :
Dept. of Phys., Sultan Qaboos Univ., Muscat, Oman
fYear :
2012
fDate :
25-28 March 2012
Firstpage :
622
Lastpage :
625
Abstract :
We have used, in this contribution, the measured frequency-dependent ac admittance of irradiated Pd/n-GaN Schottky contacts at different temperatures ranging from 100K to 300K to derive the admittance associated with the displacement current in the Pd/GaN interfacial layer. The normalized conductance versus frequency plots at various temperatures, are characterized essentially by the presence of peaks, which is seen as a signature and a direct evidence for the presence of interface traps. The magnitudes and frequency positions of these peaks allowed the determination of the density and the energy distribution of interface traps as well as the thermal emission rates of carriers from traps and, hence, their capture cross-section.
Keywords :
Ge-Si alloys; Schottky barriers; electric admittance; gallium compounds; interface states; palladium; Pd-GaN; Pd/n-GaN Schottky contact; SiGe; conductance; density determination; displacement current; energy distribution; frequency position; frequency-dependent AC admittance; interface state; interface trap; magnitude; temperature 100 K to 300 K; temperature-dependent admittance; thermal emission rate; Admittance; Frequency measurement; Interface states; Schottky diodes; Silicon; Silicon germanium; Temperature measurement; Admittance spectroscopy; Interface States; Schottky Contacts;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrotechnical Conference (MELECON), 2012 16th IEEE Mediterranean
Conference_Location :
Yasmine Hammamet
ISSN :
2158-8473
Print_ISBN :
978-1-4673-0782-6
Type :
conf
DOI :
10.1109/MELCON.2012.6196508
Filename :
6196508
Link To Document :
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