DocumentCode :
2028987
Title :
Fabrication of a single crystalline silicon capacitive lateral accelerometer using micromachining based on single step plasma etching
Author :
Li, Y.X. ; French, P.J. ; Sarro, P.M. ; Wolffenbuttel, R.F.
fYear :
1995
fDate :
29 Jan-2 Feb 1995
Firstpage :
398
Keywords :
Accelerometers; Anisotropic magnetoresistance; Crystallization; Etching; Fabrication; Micromachining; Plasma applications; Plasma chemistry; Plasma immersion ion implantation; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE
Print_ISBN :
0-7803-2503-6
Type :
conf
DOI :
10.1109/MEMSYS.1995.472592
Filename :
472592
Link To Document :
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