DocumentCode
2028987
Title
Fabrication of a single crystalline silicon capacitive lateral accelerometer using micromachining based on single step plasma etching
Author
Li, Y.X. ; French, P.J. ; Sarro, P.M. ; Wolffenbuttel, R.F.
fYear
1995
fDate
29 Jan-2 Feb 1995
Firstpage
398
Keywords
Accelerometers; Anisotropic magnetoresistance; Crystallization; Etching; Fabrication; Micromachining; Plasma applications; Plasma chemistry; Plasma immersion ion implantation; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE
Print_ISBN
0-7803-2503-6
Type
conf
DOI
10.1109/MEMSYS.1995.472592
Filename
472592
Link To Document