Title :
Migration-resistant amorphous AlY metallizations for surface acoustic wave filters
Author :
Berger, L. ; Mrosk, J.W. ; Ettl, C. ; Fecht, H.J. ; Wolff, U.
Author_Institution :
Mater. Div., Ulm Univ., Germany
Abstract :
Surface acoustic wave (SAW) filters, delay lines, resonators or convolvers play a key role in consumer and communication systems such as video sets and mobile phones. The interconnects of such devices are exposed to considerable mechanical strains, which initiate fatigue. Amorphous aluminium-rare earth alloy metallizations are especially promising for replacing polycrystalline aluminium-copper interconnects, which are actually used for these micro-electromechanical systems (MEMS), because of their resistance against stress-migration and diffusion which should lead to a substantial improvement of lifetime and reliability of such devices, and their cost-effective processing. In this work, first experimental results for amorphous Al84Y16 alloy thin films deposited at room temperature (RT) by ultra-high vacuum (UHV) electron beam evaporation are presented. The composition of the films was validated by Rutherford backscattering (RBS) spectroscopy, and their amorphous structure was confirmed by X-ray diffraction (XRD) analysis. The roughness and hardness of the metallization, both important parameters for wire bonding, were investigated by scanning probe microscopy (SPM) and depth-sensing nanoindentation. The electrical resistivity was determined by four-point probe measurements. The amorphous films were annealed in UHV, and their crystallization temperature was investigated by XRD
Keywords :
Rutherford backscattering; X-ray diffraction; aluminium alloys; amorphous state; annealing; crystallisation; electrical resistivity; electron beam deposition; fatigue; hardness; interconnections; lead bonding; metallisation; scanning probe microscopy; surface acoustic wave delay lines; surface acoustic wave filters; surface acoustic wave resonators; surface acoustic wave sensors; vacuum deposition; yttrium alloys; Al84Y16; MEMS; RBS; Rutherford backscattering spectroscopy; SAW convolvers; SAW delay lines; SAW filters; SAW resonators; SPM; UHV anneal; UHV electron beam evaporation; X-ray diffraction analysis; XRD; amorphous Al84Y16 alloy thin films; amorphous aluminium-rare earth alloy metallizations; amorphous films; amorphous structure; communication systems; consumer systems; cost-effective processing; crystallization temperature; depth-sensing nanoindentation; device lifetime; device reliability; diffusion resistance; electrical resistivity; fatigue; four-point probe measurements; interconnects; mechanical strains; metallization hardness; metallization roughness; micro-electromechanical systems; migration-resistant amorphous AlY metallizations; mobile phones; polycrystalline aluminium-copper interconnects; scanning probe microscopy; stress-migration resistance; surface acoustic wave filters; video sets; wire bonding; Acoustic waves; Aluminum alloys; Amorphous materials; Metallization; Resonator filters; Scanning probe microscopy; Surface acoustic wave devices; Surface acoustic waves; Temperature; X-ray scattering;
Conference_Titel :
Industrial Electronics Society, 2000. IECON 2000. 26th Annual Confjerence of the IEEE
Conference_Location :
Nagoya
Print_ISBN :
0-7803-6456-2
DOI :
10.1109/IECON.2000.972559