DocumentCode
2030948
Title
Failure analysis of a hybrid device exhibiting copper dendrite growth on thick film resistors
Author
Dixon, Jeffrey B. ; Northrup, Mark R. ; Rooney, Daniel T.
Author_Institution
Oneida Res. Services Inc., Whitesboro, NY, USA
fYear
1991
fDate
11-16 May 1991
Firstpage
109
Lastpage
119
Abstract
The authors discuss the failure analysis performed on several hybrid devices submitted to Oneida Research Services, Inc. The analysis was initiated because of electrical testing failures-a voltage divider exhibited an out-of-specification value during burn-in at elevated temperature. This voltage divider compared the outputs of two thick-film resistors. Analysis of the hybrid failures revealed a copper dendritic growth propagating across the laser trims in the thick film resistor. The authors describe the hybrid materials construction, environmental testing, and electrical testing performed in examining the factors which led to the dendrite growth and overall failure of the hybrids. A detailed description of the analytical equipment and methodology used in identifying the cause of the copper dendrite growth as a result of processing is presented. The authors conclude with a discussion of the failure analysis
Keywords
copper; dendrites; failure analysis; hybrid integrated circuits; laser beam machining; thick film resistors; Cu dendrite growth; Oneida Research Services; analytical equipment; electrical testing; environmental testing; failure analysis; hybrid device; laser trims; methodology; thick film resistors; voltage divider; Building materials; Copper; Failure analysis; Materials testing; Optical materials; Optical propagation; Resistors; Temperature; Thick films; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 1991. Proceedings., 41st
Conference_Location
Atlanta, GA
Print_ISBN
0-7803-0012-2
Type
conf
DOI
10.1109/ECTC.1991.163862
Filename
163862
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