A pyrex nanochannel device fabricated by AFM nanolithography

A Pyrex nanochannel device was fabricated using AFM nanolithography in conjunction with MEMS-based microfabrication. The fabrication process began with the patterning of microchannels on a Pyrex substrate using photolithography and wet etching. AFM nanolithography was then performed to realize a nanochannel between the micro reservoirs. A diamond-coated AFM probe with a relatively large force constant served as the cutting tool. A detailed study was conducted to determine the relationship between the AFM input parameters and the resultant nanochannel dimensions. A linear trend was obtained between the AFM scratch force and the nanochannel depth. A similar trend was also observed between the number of repeated scratches and the channel depth. Minimal material pileup on the nanochannel sidewall was observed during the scratch process. Flow patency in the capped-off nanochannel was demonstrated through fluorescence microscopy.