DocumentCode :
2031918
Title :
Study of the low frequency noise from 77 K to 300 K in NbN semiconductor thin films deposited on silicon
Author :
Leroy, G. ; Gest, J. ; Tabourier, P. ; Carru, J.C. ; Xavier, P. ; Andre, E. ; Chaussy, J.
Author_Institution :
Laboratoire d´´Etude des Materiaux et des Composants pour l´´Electronique
fYear :
2002
fDate :
2002
Firstpage :
175
Lastpage :
178
Keywords :
Electrical resistance measurement; Frequency measurement; Low-frequency noise; Noise measurement; Semiconductor device noise; Semiconductor films; Semiconductor materials; Semiconductor thin films; Superconducting device noise; Superconducting films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Temperature Electronics, 2002. Proceedings of the 5th European Workshop on
ISSN :
1155-4339
Print_ISBN :
2-86883-606-2
Type :
conf
DOI :
10.1109/WOLTE.2002.1022476
Filename :
1022476
Link To Document :
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