Title :
Litho area cycle time reduction in an advanced 300mm semiconductor manufacturing line
Author :
Van der Eerden, Joris ; Saenger, Tim ; Walbrick, Walter ; Niesing, Henk ; Schuurhuis, Ron
Author_Institution :
ASML Netherlands BV, Veldhoven
Abstract :
In this paper, we describe new methodologies used to decrease the cycle time in a semiconductor fab´s litho area. New types of analysis have been used, such as EPT for cluster systems, effective utilization, and cluster uptime
Keywords :
lithography; semiconductor device manufacture; 300 mm; EPT; cluster systems; litho area cycle time reduction; semiconductor manufacturing line; Feedback loop; Fluctuations; Instruments; Lithography; Manufacturing processes; Metrology; Pulp manufacturing; Semiconductor device manufacture; USA Councils; Virtual manufacturing;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638734
