• DocumentCode
    2032606
  • Title

    Litho area cycle time reduction in an advanced 300mm semiconductor manufacturing line

  • Author

    Van der Eerden, Joris ; Saenger, Tim ; Walbrick, Walter ; Niesing, Henk ; Schuurhuis, Ron

  • Author_Institution
    ASML Netherlands BV, Veldhoven
  • fYear
    2006
  • fDate
    22-24 May 2006
  • Firstpage
    114
  • Lastpage
    119
  • Abstract
    In this paper, we describe new methodologies used to decrease the cycle time in a semiconductor fab´s litho area. New types of analysis have been used, such as EPT for cluster systems, effective utilization, and cluster uptime
  • Keywords
    lithography; semiconductor device manufacture; 300 mm; EPT; cluster systems; litho area cycle time reduction; semiconductor manufacturing line; Feedback loop; Fluctuations; Instruments; Lithography; Manufacturing processes; Metrology; Pulp manufacturing; Semiconductor device manufacture; USA Councils; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    1-4244-0254-9
  • Type

    conf

  • DOI
    10.1109/ASMC.2006.1638734
  • Filename
    1638734
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2032606