DocumentCode :
2032664
Title :
Dry mechanical liftoff technology for metallization on parylene-C using SU-8
Author :
Chang, Jay Han-Chieh ; Kang, Dongyang ; Tai, Yu-Chong
Author_Institution :
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA
fYear :
2012
fDate :
5-8 March 2012
Firstpage :
286
Lastpage :
289
Abstract :
This paper presents a new fabrication method to employ dry mechanical liftoff of SU-8 mask to pattern metals on parylene-C film. Soaking tests were done to examine the adhesion between SU-8 and parylene-C film with different interface treatments. SU-8 masks with different thickness were tested in order to find out the best trade-off between the feature sizes and the easiness of removal from paryelene-C film after metal deposition. Features from 10 μm to 300 μm in diameter and width were successfully patterned on parylene-C film by this method. The 15 μm thick SU-8 liftoff mask is highly flexible and can be peeled off mechanically from parylene-C film by tweezers seconds without any visible residue. Metal lines with testing pads from 10 μm to 100 μm wide and 1 cm long were also fabricated and tested to evaluate their resistances. this new method provides an alternative way of metallization on parylene-C film which benefits the application in MEMS area.
Keywords :
masks; metallisation; SU-8 mask; adhesion; dry mechanical liftoff technology; fabrication method; interface treatments; metal deposition; metallization; parylene-C film; soaking tests; Adhesives; Gold; Lithography; SU-8; liftoff; metalization; parylene-C;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-1122-9
Type :
conf
DOI :
10.1109/NEMS.2012.6196776
Filename :
6196776
Link To Document :
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