Fabrication of nanogap electrode using electromigration method during metal deposition

In this paper, we suggest a new electormigration method to improve the previous electromigration method. The method is that electrical break-down is carried out during metal deposition for the fabrication of electrodes. As a result, the nanogap structure can be confirmed and break-down current showed lower magnitudes than the previous method. These result indicated possibility of applications to mass production of nanogap electrodes.