• DocumentCode
    2032973
  • Title

    Improving Gate Poly CD Bias Control Using Voltage Controller Interface

  • Author

    Daigle, Cindy

  • Author_Institution
    National Semicond., South Portland, ME
  • fYear
    2006
  • fDate
    22-24 May 2006
  • Firstpage
    169
  • Lastpage
    171
  • Abstract
    In this paper, an etching tool hardware solution is presented for minimizing poly gate width variation induced by lower RF system equipment changes
  • Keywords
    etching; machine tools; process control; voltage regulators; CD bias control; RF system equipment; etching tool; gate poly etch; poly gate width variation; process control; voltage controller interface; Control systems; Electrostatics; Etching; Hardware; Plasma applications; Power generation; Process control; Radio frequency; Resists; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    1-4244-0254-9
  • Type

    conf

  • DOI
    10.1109/ASMC.2006.1638745
  • Filename
    1638745
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2032973