Title :
Optimization of Ultrasonic Cleaning for Erosion-Sensitive Microelectronic Components
Author :
Nagarajan, Radhakrishnan ; Diwan, M. ; Awasthi, P. ; Shukla, A. ; Sharm, P. ; Goodson, M. ; Awad, S.
Author_Institution :
Dept of Chem. Eng., Indian Inst. of Technol., Madras
Abstract :
In this paper, we describe an experimental study undertaken to investigate ultrasonic fields in the frequency range 58-192 kHz with respect to their surface cleaning and erosion potential. Measurements are performed using three different methods - gravimetric weight-loss, surface profilometry, and precision turbidimetry - to assess these mechanisms for a variety of materials, including semiconductors. Conclusions are drawn regarding the nature of interaction between high-frequency, high-intensity ultrasonic fields and immersed surfaces. Recommendations are provided for optimal settings to maximize surface cleanability and minimize erodibility of sensitive substrates
Keywords :
semiconductor materials; turbidimetry; ultrasonic cleaning; 58 to 192 kHz; erosion-sensitive microelectronic components; gravimetric weight-loss; immersed surfaces; precision turbidimetry; surface cleaning; surface erosion; surface profilometry; ultrasonic cleaning; Acoustic measurements; Chemical engineering; Chemical technology; Frequency; Microelectronics; Substrates; Surface cleaning; Surface contamination; Ultrasonic variables measurement; Weight measurement;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638750
