DocumentCode
2033138
Title
Electron transport pecularities in GaN FET´s
Author
Pashkovskiy, A.B.
Author_Institution
Fed. State Unitary Corp. R&PC Istok, Fryazino, Russia
fYear
2013
fDate
8-14 Sept. 2013
Firstpage
120
Lastpage
121
Abstract
Comparison of electron transport peculiarities of GaN and GaAs transistors has been carried out. It is shown that because of a splash of drift speed its value under a device lock made of GaAs almost doubles the value of drift speed in the transistor on basis of GaN, even at the identical value of mobility of electrons and in spite of much higher values of static speed of electrons in GaN in the strong fields.
Keywords
III-V semiconductors; field effect transistors; gallium arsenide; wide band gap semiconductors; FET; GaAs; GaN; device lock; drift speed; electron transport pecularity; Electronic mail; Field effect transistors; Gallium arsenide; Gallium nitride; Logic gates; Region 8;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology (CriMiCo), 2013 23rd International Crimean Conference
Conference_Location
Sevastopol
Print_ISBN
978-966-335-395-1
Type
conf
Filename
6652728
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