• DocumentCode
    2033138
  • Title

    Electron transport pecularities in GaN FET´s

  • Author

    Pashkovskiy, A.B.

  • Author_Institution
    Fed. State Unitary Corp. R&PC Istok, Fryazino, Russia
  • fYear
    2013
  • fDate
    8-14 Sept. 2013
  • Firstpage
    120
  • Lastpage
    121
  • Abstract
    Comparison of electron transport peculiarities of GaN and GaAs transistors has been carried out. It is shown that because of a splash of drift speed its value under a device lock made of GaAs almost doubles the value of drift speed in the transistor on basis of GaN, even at the identical value of mobility of electrons and in spite of much higher values of static speed of electrons in GaN in the strong fields.
  • Keywords
    III-V semiconductors; field effect transistors; gallium arsenide; wide band gap semiconductors; FET; GaAs; GaN; device lock; drift speed; electron transport pecularity; Electronic mail; Field effect transistors; Gallium arsenide; Gallium nitride; Logic gates; Region 8;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Telecommunication Technology (CriMiCo), 2013 23rd International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-966-335-395-1
  • Type

    conf

  • Filename
    6652728