DocumentCode :
2033138
Title :
Electron transport pecularities in GaN FET´s
Author :
Pashkovskiy, A.B.
Author_Institution :
Fed. State Unitary Corp. R&PC Istok, Fryazino, Russia
fYear :
2013
fDate :
8-14 Sept. 2013
Firstpage :
120
Lastpage :
121
Abstract :
Comparison of electron transport peculiarities of GaN and GaAs transistors has been carried out. It is shown that because of a splash of drift speed its value under a device lock made of GaAs almost doubles the value of drift speed in the transistor on basis of GaN, even at the identical value of mobility of electrons and in spite of much higher values of static speed of electrons in GaN in the strong fields.
Keywords :
III-V semiconductors; field effect transistors; gallium arsenide; wide band gap semiconductors; FET; GaAs; GaN; device lock; drift speed; electron transport pecularity; Electronic mail; Field effect transistors; Gallium arsenide; Gallium nitride; Logic gates; Region 8;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology (CriMiCo), 2013 23rd International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-966-335-395-1
Type :
conf
Filename :
6652728
Link To Document :
بازگشت