Title :
Point-of-Use Ultra-Pure Water for Immersion Lithography
Author :
Clarke, Michael E. ; Xia, Annie ; Smith, Joseph ; Parekh, Bipin
Author_Institution :
Entegris, Inc., Billerica, MA
Abstract :
In this paper we describe the design and development of point-of-use UPW (ultra pure water) components and systems for the immersion application. The paper addresses the water quality needs for the immersion lithography process and presents key contaminant removal techniques and performance results. POU water delivery systems are designed based upon individual customer needs
Keywords :
decontamination; immersion lithography; contaminant removal techniques; immersion lithography; ion purification; point-of-use ultra-pure water; temperature control; water quality; Impurities; Lenses; Lithography; Optical imaging; Optical refraction; Optical variables control; Production; Refractive index; Switches; Water pollution;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638751
