DocumentCode
2033151
Title
Point-of-Use Ultra-Pure Water for Immersion Lithography
Author
Clarke, Michael E. ; Xia, Annie ; Smith, Joseph ; Parekh, Bipin
Author_Institution
Entegris, Inc., Billerica, MA
fYear
2006
fDate
22-24 May 2006
Firstpage
196
Lastpage
201
Abstract
In this paper we describe the design and development of point-of-use UPW (ultra pure water) components and systems for the immersion application. The paper addresses the water quality needs for the immersion lithography process and presents key contaminant removal techniques and performance results. POU water delivery systems are designed based upon individual customer needs
Keywords
decontamination; immersion lithography; contaminant removal techniques; immersion lithography; ion purification; point-of-use ultra-pure water; temperature control; water quality; Impurities; Lenses; Lithography; Optical imaging; Optical refraction; Optical variables control; Production; Refractive index; Switches; Water pollution;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
1-4244-0254-9
Type
conf
DOI
10.1109/ASMC.2006.1638751
Filename
1638751
Link To Document