• DocumentCode
    2033610
  • Title

    Can You Reduce the Amount of CDs Measured, While Retaining the Required Sensitivity of Statistical Process Control (SPC)?

  • Author

    Eidelman, Anna ; Asscher, Jacqueline

  • Author_Institution
    Mask Technol. & Simulation Group, Tower Semicond. Ltd.
  • fYear
    2006
  • fDate
    22-24 May 2006
  • Firstpage
    284
  • Lastpage
    288
  • Abstract
    In this paper, we describe a method of determining the amount of sampling needed for effective process control of photolithographic critical dimensions (CDs) using an advanced statistical approach. This method can also be used for other processes (thin films, CMP, diffusion, ETCH) where SPC is applied
  • Keywords
    photolithography; sampling methods; statistical process control; critical dimensions control; photolithographic critical dimensions; sampling; statistical process control; Control charts; Data structures; Etching; Frequency measurement; Monitoring; Poles and towers; Process control; Production; Sampling methods; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    1-4244-0254-9
  • Type

    conf

  • DOI
    10.1109/ASMC.2006.1638769
  • Filename
    1638769
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2033610