Title :
Can You Reduce the Amount of CDs Measured, While Retaining the Required Sensitivity of Statistical Process Control (SPC)?
Author :
Eidelman, Anna ; Asscher, Jacqueline
Author_Institution :
Mask Technol. & Simulation Group, Tower Semicond. Ltd.
Abstract :
In this paper, we describe a method of determining the amount of sampling needed for effective process control of photolithographic critical dimensions (CDs) using an advanced statistical approach. This method can also be used for other processes (thin films, CMP, diffusion, ETCH) where SPC is applied
Keywords :
photolithography; sampling methods; statistical process control; critical dimensions control; photolithographic critical dimensions; sampling; statistical process control; Control charts; Data structures; Etching; Frequency measurement; Monitoring; Poles and towers; Process control; Production; Sampling methods; Semiconductor device manufacture;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638769
