Title :
The reliability study of laser trimmed resistor components
Author :
Huang, Yusue ; Cook, Robert F. ; Smith, William F.
Author_Institution :
IBM Gen. Technol. Center, East Fishkill, NY, USA
Abstract :
A process model was established to understand the formation of stresses within the silica overlayer using TFR (thin-film resistor) laser trimming. The stresses were calculated using a thermal inclusion model. The stress resulting from laser trim created delaminations lead to cone crack formation. The cracks and delaminations were examined by fracture mechanics and reliability experiments. Based on the morphology, the cracks were treated as those generated by a flat, elastic punch loading on free surfaces. These types of cracks possess equilibrium lengths and are stable. The strength of silica containing such cracks was calculated as a function of crack length. It was found that the stresses required to propagate the cracks to failure were very large, well above any stresses likely to be generated in usage. There were no failures observed during the reliability experiments. Therefore, the cracks and delamination are not a reliability concern under normal usage conditions
Keywords :
delamination; fracture mechanics; modelling; reliability; thermal stress cracking; thin film resistors; SiO2; cone crack formation; crack length; delaminations; equilibrium lengths; fracture mechanics; laser trimmed resistor components; morphology; process model; reliability study; silica overlayer; stresses; thermal inclusion model; thin-film resistor; Ceramics; Delamination; Insulation; Laser stability; Morphology; Resistors; Semiconductor thin films; Silicon compounds; Stress; Substrates;
Conference_Titel :
Electronic Components and Technology Conference, 1991. Proceedings., 41st
Conference_Location :
Atlanta, GA
Print_ISBN :
0-7803-0012-2
DOI :
10.1109/ECTC.1991.163896