DocumentCode
2035089
Title
Finite integration (FI) method for modelling optical waves in lithography masks
Author
Rahimi, Z. ; Erdmann, A. ; Pflaum, C.
Author_Institution
Fraunhofer Inst. IISB, Erlangen, Germany
fYear
2009
fDate
14-18 Sept. 2009
Firstpage
809
Lastpage
812
Abstract
Light diffraction from lithography masks depends on the geometrical shape of the mask pattern which is created by an etch process. The analysis of relevant effects requires the application of an accurate electromagnetic field solver. In this paper, we present an appropriate simulation method based on the Finite Integration (FI) technique for solving Maxwell´s equations.
Keywords
Maxwell equations; integration; light diffraction; masks; photolithography; Maxwell equations; electromagnetic field solver; finite integration method; light diffraction; lithography masks; mask pattern geometrical shape; optical waves; Electromagnetic analysis; Electromagnetic diffraction; Electromagnetic fields; Etching; Geometrical optics; Integrated optics; Lithography; Maxwell equations; Optical diffraction; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Electromagnetics in Advanced Applications, 2009. ICEAA '09. International Conference on
Conference_Location
Torino
Print_ISBN
978-1-4244-3385-8
Electronic_ISBN
978-1-4244-3386-5
Type
conf
DOI
10.1109/ICEAA.2009.5297317
Filename
5297317
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