Title :
Investigation of characteristics and mechanical properties of nitrogen incorporated carbon films prepared by PIII-D
Author :
Wen, Fushuan ; Huang, Nicole ; Sun, Hongbin ; Leng, Y.X. ; Yang, Ping ; Wan, G.J. ; Chen, J.Y. ; Wang, Jiacheng
Author_Institution :
Inst. of Biomaterials & Surface Eng., Southwest Jiaotong Univ., Sichuan, China
Abstract :
Summary form only given, as follows. In this paper, nitrogen incorporated carbon films were prepared by plasma immersion ion implantation and deposition (PIII-D) at room temperature, where carbon ions was generated by metal vapor vacuum arc (MEVVA) source and reacted with N/sub 2/ in the vacuum chamber.
Keywords :
carbon; elemental semiconductors; mechanical properties; nitrogen; plasma deposition; plasma immersion ion implantation; 293 K; C:N; PIII-D; mechanical properties; plasma deposition; plasma immersion ion implantation; room temperature; Biomedical optical imaging; Bonding; Ion implantation; Mechanical factors; Niobium; Nitrogen; Optical films; Plasma applications; Plasma immersion ion implantation; Semiconductor films;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229941
