• DocumentCode
    2036420
  • Title

    The start-up and preliminary operation of the 60 kV plasma ion implantation system

  • Author

    Kim, Ji H. ; Nikiforov, S.A. ; Shenderey, S.V. ; Rim, Geun Hie ; Kim, Jung-Ho ; You, Y.Z.

  • Author_Institution
    Korea Electrotechnol. Res. Inst., Gyeongnam, South Korea
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    401
  • Abstract
    Summary form only given, as follows. The paper presents the result of start-up and preliminary operation of the 60 kV, 100 L plasma immersion ion implantation (PI/sup 3/) system for material processing.
  • Keywords
    plasma immersion ion implantation; plasma materials processing; 60 kV; material processing; plasma immersion ion implantation; preliminary operation; Atomic measurements; Etching; Ion implantation; Plasma applications; Plasma density; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma temperature; Pulse transformers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1229943
  • Filename
    1229943
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2036420