DocumentCode
2036449
Title
The space-time evolution of species concentrations in the etching process measured by optical plasma emission spectroscopy
Author
Lin, T.-L. ; Ting, H.-C. ; Leou, Keh-Chyang
Author_Institution
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2003
fDate
5-5 June 2003
Firstpage
401
Abstract
Summary form only given, as follows. An inductively coupled plasma etching system was set up at the Department of Engineering and System Science, National Tsing-Hua University.
Keywords
atomic emission spectroscopy; plasma chemistry; sputter etching; etching process; inductively coupled plasma etching system; optical plasma emission spectroscopy; space-time evolution; species concentrations; Atom optics; Atomic measurements; Etching; Nuclear and plasma sciences; Plasma applications; Plasma materials processing; Plasma measurements; Spectroscopy; Stimulated emission; Systems engineering and theory;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229944
Filename
1229944
Link To Document