Title :
The space-time evolution of species concentrations in the etching process measured by optical plasma emission spectroscopy
Author :
Lin, T.-L. ; Ting, H.-C. ; Leou, Keh-Chyang
Author_Institution :
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
Summary form only given, as follows. An inductively coupled plasma etching system was set up at the Department of Engineering and System Science, National Tsing-Hua University.
Keywords :
atomic emission spectroscopy; plasma chemistry; sputter etching; etching process; inductively coupled plasma etching system; optical plasma emission spectroscopy; space-time evolution; species concentrations; Atom optics; Atomic measurements; Etching; Nuclear and plasma sciences; Plasma applications; Plasma materials processing; Plasma measurements; Spectroscopy; Stimulated emission; Systems engineering and theory;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229944
