DocumentCode :
2036717
Title :
Mechanical properties and structural characteristics of hydrogen incorporated carbon films synthesized by PIII-D
Author :
Wen, Fushuan ; Huang, Nicole ; Sun, Hongbin ; Yang, Ping ; Leng, Y.X. ; Chen, J.Y. ; Wan, G.J.
Author_Institution :
Inst. of Biomaterials & Surface Eng., Southwest Jiaotong Univ., Sichuan, China
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
406
Abstract :
Summary form only given, as follows. Amorphous hydrogenated carbon a-C:H thin films have become of great interest because of their possible applications in mechanics, optics and electronics. Wide band-gap a-C:H films have been proposed as a material suitable for light emitting devices and flat panel displays due to the photoluminescence efficiency they show even at room temperature. Hydrogenated carbon films were deposited on silicon wafers using plasma immersion ion implantation and deposition (PIII-D). Graphite was used as cathode material and hydrogen gas was selected as the working gas.
Keywords :
amorphous semiconductors; elemental semiconductors; flat panel displays; hydrogen; light emitting devices; mechanical properties; photoluminescence; plasma deposition; plasma immersion ion implantation; C:H; PIII-D; a-C:H thin films; flat panel displays; light emitting devices; mechanical properties; photoluminescence efficiency; plasma deposition; plasma immersion ion implantation; room temperature; structural characteristics; Amorphous materials; Carbon dioxide; Hydrogen; Mechanical factors; Optical films; Optical materials; Particle beam optics; Photonic band gap; Stimulated emission; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1229954
Filename :
1229954
Link To Document :
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