Title :
Formation of hydrophobic thin films on metal surfaces
Author :
Hyun Soh ; Sei-ki Moon ; Young Chai Kim
Author_Institution :
Dept. of Chem. Eng., Hanyang Univ., South Korea
Abstract :
Summary form only given, as follows. One of the surface properties, water-repellency or hydrophobicity, has been attracted attention in various industrial fields. Hydrophobic surface treatment of materials and preparation of water-repellent films have been performed by using plasma deposition techniques. In this work, the plasma enhanced chemical vapor deposition (PECVD) method has been employed to coat thin fluorocarbon film on metal surface.
Keywords :
metals; organic compounds; plasma CVD; surface treatment; PECVD; hydrophobic surface treatment; hydrophobic thin films formation; metal surface; metal surfaces; plasma enhanced chemical vapor deposition; surface properties; thin fluorocarbon film; water-repellency; Chemical industry; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma measurements; Plasma properties; Polymer films; Sputtering; Surface treatment; Transistors;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229964
